WET process equipment sheet-type spin processor
By placing multiple devices, it is possible to easily achieve multi-processing.
The WET process equipment single-wafer spin processor cleans and rinses the substrate through spin rotation and spraying, followed by drying with high-speed spin rotation. By arranging multiple units, it is easy to achieve multi-process operations (e.g., developing → etching → cleaning, drying). The WET equipment technology from Denshi Giken Co., Ltd., including spin cleaning, can meet the needs of various industries such as semiconductors, LCDs, medical, and food industries, by cleaning wafers, glass substrates, printed circuit boards, metal substrates, and more. 【Features】 ○ Excellent particle removal performance ○ Significant reduction in takt time through high-speed spin cleaning ○ Compact design achieved through space-saving For more details, please contact us or download the catalog.
- Company：電子技研
- Price：Other
